Partisanship may be a problem on Capitol Hill but there was a surprising amount of common ground between a Republican and a Democrat in a debate, Tuesday, at the CIO Network conference in San Diego. Professor Lee Ohanian, a senior fellow at the conservative Hoover Institution, discussed technology policy and innovation with Robert Reich, former U.S. Secretary of Labor during the Clinton Administration.
The pair said the government should support basic research, avoid politicizing innovation policy, modernize the patent system and reform immigration by expanding the number of visas for foreign workers who specialize in technology. The discussion was moderated by David Wessel, economics editor at The Wall Street Journal.
To read the original article: Reich and Ohanian Say Immigration Reform Critical for Tech Innovation - The CIO Report - WSJ
